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Low-temperature solution phase route for the synthesis of silicon nanoclusters

Journal Article · · Journal of the American Chemical Society
DOI:https://doi.org/10.1021/ja962787s· OSTI ID:447211
;  [1]
  1. Univ. of California, Davis, CA (United States)
We report here a new solution phase synthesis for producing crystalline silicon nanoclusters at significantly lower temperatures than previously required. In addition, it is performed at ambient pressure and yields a particle surface that can be modified by chemical methods. This method has the potential to yield large amounts of silicon nanocrystals in addition to providing reliable control over size distribution and surface termination. In this synthesis we use the Zintl salt KSi as a starting reagent. KSi is synthesized by reacting excess K with silicon at 650{degree}C for three days and subliming off the excess K at 275{degree}C under vacuum. The purity of the air-sensitive, black solid is verified by powder X-ray diffraction. 23 refs., 1 fig.
DOE Contract Number:
AC03-76SF00098
OSTI ID:
447211
Journal Information:
Journal of the American Chemical Society, Journal Name: Journal of the American Chemical Society Journal Issue: 49 Vol. 118; ISSN JACSAT; ISSN 0002-7863
Country of Publication:
United States
Language:
English

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