Thermal boundary resistance and diffusivity for YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} films
Journal Article
·
· Physical Review, B: Condensed Matter
- Institut fuer Angewandte Physik, Universitaet Regensburg, D-93040 Regensburg (Germany)
We have measured the thermoelectric response of off-{ital c}-axis epitaxial YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} films with thicknesses between 35 and 500 nm using laser pulses at uv and IR wavelengths. Due to the anisotropy of the thermopower in YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}}, these off-{ital c}-axis films show a voltage response proportional to the average temperature gradient in the film which provides a sensitive probe of the temperature distribution within the film. A comparison of the experimetnal data and calculations with a thermal model for films with different thicknesses, allows us to extract the diffusivity of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} and the thermal boundary resistance of the film-substrate boundary. Irradiating the films through the substrate leads to a situation where heat flow in the interfacial region dominates. The shape of the voltage signals depends strongly on the value assumed for the thermal boundary resistance. A consistent description for both illumination directions is found only in a narrow range around {ital R}{sub bd}{approx}0.5{times}10{sup {minus}3} K cm{sup 2}/W.
- OSTI ID:
- 44554
- Journal Information:
- Physical Review, B: Condensed Matter, Journal Name: Physical Review, B: Condensed Matter Journal Issue: 17 Vol. 51; ISSN 0163-1829; ISSN PRBMDO
- Country of Publication:
- United States
- Language:
- English
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