Onset for superfluid flow in $sup 4$He films on a variety of substrates
Journal Article
·
· Phys. Rev. Lett., v. 30, no. 22, pp. 1122-1125
OSTI ID:4414585
The onset of superfluid flow in He/sup 4/ films was measured between 1.37 and 2.13 K on substrates of NaF, Caf/sub 2/, SiO/sub 2/, Si, and Grafoil. Values of the Van der Waals constant of 19, 26, and 65 K were obtained for NaF, SiO/sub 2/, and Grafoil, respectively. In addition, a precise measurement of the critical thickness of the liquid-helium film was obtained, taking into account a small correction for the influence of the substrate. (auth)
- Research Organization:
- RCA Laboratories, Princeton, New Jersey, 08540
- NSA Number:
- NSA-29-001525
- OSTI ID:
- 4414585
- Journal Information:
- Phys. Rev. Lett., v. 30, no. 22, pp. 1122-1125, Journal Name: Phys. Rev. Lett., v. 30, no. 22, pp. 1122-1125; ISSN PRLTA
- Country of Publication:
- United States
- Language:
- English
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