Grain growth in boron doped Ni{sub 76}Al{sub 24}

Journal Article · Sat Feb 01 04:00:00 EST 1997 · Scripta Materialia

DOI:https://doi.org/10.1016/S1359-6462(96)00385-5· OSTI ID:438602

Chaturvedi, M C ^[1]; Banerjee, S; Jena, A K ^[2]

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1. Univ. of Manitoba, Winnipeg, Manitoba (Canada). Dept. of Mechanical and Industrial Engineering
2. I.I.T., Kanpur (India). Dept. of Materials and Metallurgical Engineering

Recrystallization and grain growth behavior of superlattice alloys, particularly those having the L1{sub 2} structure have been of considerable scientific and engineering interest in recent years. The limited data available on the kinetics of grain growth in L1{sub 2} type compounds appear to be inconsistent with each other. For grain growth in Zr{sub 3}Al, the activation energy could not be determined and n was between 0.29 and 0.36. Values of n were in the range of 0.2 to 0.41 for grain growth in Ni{sub 3}Al. The activation energy for grain growth in this compound has not been determined. For grain growth in the compound Co{sub 3}Ti, the activation energy has been found to be close to that for recrystallization. In this study the kinetics of grain growth in the boron doped compound Ni{sub 76}Al{sub 24} have been investigated.

• Sponsoring Organization: Natural Sciences and Engineering Research Council of Canada, Ottawa, ON (Canada)
• OSTI ID: 438602
• Journal Information: Scripta Materialia, Journal Name: Scripta Materialia Journal Issue: 3 Vol. 36; ISSN 1359-6462; ISSN SCMAF7
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM ALLOYS
BORON ADDITIONS
GRAIN BOUNDARIES
GRAIN GROWTH
KINETICS
MELTING
NICKEL ALLOYS
SEGREGATION