Dependence of space distribution of particles sputtered from monocrystalline copper on ion-incidence angle
The dependence of the angular distribution of atoms sputtered from the (001) monocrystalline copper face on the incidence angle of 22-keV neon ions was studied. Use is made of well-known ideas defining the observed distribution as a result of superposition of the directed atomic yield along the close-packed axes and of the random yield along all directions. The values obtained for the relative contribution of the directed and random sputterings indicate that the dependence of these values on the ion incidence angle is distinctiy anisotropic. The yield of the directed sputtering had a minimum value when the incidence directions of the bombarding ions coincided with the low-index crystallographic axes. In addition, the width of {011} and STA001! pattern spots was also found to be an anisotropic function of the ion incidence angle. The spots have the smallest width when the direction of ion incidence coincides with the low-index axes. The observed dependences are discussed on the basis of the focusing mechanism of the sputtered atom yield. (auth)
- Research Organization:
- Moscow State Univ.
- NSA Number:
- NSA-29-016348
- OSTI ID:
- 4360755
- Journal Information:
- Radiat. Eff., v. 19, no. 4, pp. 215-218, Conference: International conference on ion-surface interaction, sputtering, and related phenomena, Garching, Ger., Sep 1972; Other Information: Orig. Receipt Date: 30-JUN-74; Bib. Info. Source: UK (United Kingdom (sent to DOE from))
- Country of Publication:
- United Kingdom
- Language:
- English
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