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An electron attachment plasma instability

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1654978· OSTI ID:4359044
A new type of plasma instability is described in an electron-beam ionized discharge. This instability occurs in gas mixtures in which the dissociative attachment rate increases strongly with electric field. It has been observed experimentally in He:H2O 740 : 20 and in He:CO 1:1 and 9:1 mixtures. The values of the ionization source function S and of the electric field E at which the wave instability occurs are predicted using a Fourier analysis of the linearized kinetic rate equations. This yields the condition for instability as S < (l/ alpha )[E( partial delta BETA / partial delta E) - BETA ]2 , where alpha is the electron-ion recombination coefficient and BETA is the electron neutral attachment rate.
Research Organization:
Avco Everett Research Laboratory, Inc. Everett, Massachusetts 02149
Sponsoring Organization:
USDOE
NSA Number:
NSA-29-014407
OSTI ID:
4359044
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 9 Vol. 23; ISSN APPLAB; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English

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