High-repetition-rate pulsed operation of a wire ion plasma source

Conference · Tue Dec 31 04:00:00 EST 1996

OSTI ID:433884

Urai, Hajime; Kurosawa, Tadashi; Okino, Akitoshi; Hotta, Eiki ^[1]; Ko, K C ^[2]

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1. Tokyo Inst. of Tech., Yokohama (Japan). Dept. of Energy Sciences
2. Hanyang Univ., Seoul (Korea, Republic of). Dept. of Electrical Engineering

The Wire Ion Plasma Source (WIPS) has the potential as a high-density-plasma source and a large-cross sectional ion source that can be used for the secondary emission electron gun. The secondary emission electron gun of this type usually operates under the pulse mode and is suitable for high repetition rate operations. The WIPS is a cold-cathode gaseous discharge device based on the low-pressure wire discharge. The anode is a thin tungsten wire. The cathode consists of a stainless steel cylinder (40 mm i.d., 100 mm long) which is set coaxially to the wire anode and the plates having central apertures at both ends. This configuration produces not only a radial logarithmic trapping potential but also an axial one for electrons, and permits low-pressure gaseous discharge to occur with very low applied voltage. The authors examined the high-repetition-rate pulsed operation controlled by the electrostatic trigger of plasma source itself. The achieved repetition rate was 2 kHz when the applied anode voltage was 4 kV and helium gas pressure was 25 mTorr. The amplitude of the discharge current was 200 A and the pulse width was about 1 {micro}s.

• OSTI ID: 433884
• Report Number(s): CONF-960634--
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
ELECTRIC DISCHARGES
ELECTRON GUNS
ION SOURCES
OPERATION
PLASMA PRODUCTION