PULSED ION SOURCE
An ion source is described for producing very short high density pulses of ions without bcam scattering. The ions are created by an oscillating electron discharge within a magnetic field. After the ions are drawn from the ionization chamber by an accelerating electrode the ion beam is under the influence of the magnetic field for separation of the ions according to mass and, at the same time, passes between two neutralizing plntes maintained nt equal negative potentials. As the plates are formed of a material having a high ratio of secondary electrons to impinging ions, the ion bombardment of the plntes emits electrons which neutralize the frirge space-charge of the beam and tend to prevent widening of the beam cross section due to the mutual repulsion of the ions.
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-12-014468
- Assignee:
- U. S. Atomic Energy Commission
- Patent Number(s):
- US 2839706
- OSTI ID:
- 4330220
- Resource Relation:
- Other Information: Orig. Receipt Date: 31-DEC-58
- Country of Publication:
- United States
- Language:
- English
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