FORMATION OF HARD INTERMETALLIC COATINGS FROM ELECTRO-DEPOSITED LAYERS OF TITANIUM, ZIRCONIUM, HAFNIUM, VANADIUM, NIOBIUM, TANTALUM, CHROMIUM, MOLYBDENUM AND TUNGSTEN
A cladding layer of the refractory metal is formed on the base metal. Either simultaneously or subsequently a transfer of a refractory metal-hardening element from the mass of the base metal to the cladding layer of the refractory metal is effected. A fused salt bath is used, composed essentially of a halide of the refractory element and a diluent halide salt. The base metal incorporating the inter metalic compoundforming element (carbon, nitrogen boron or silicon) is immersed in the bath as the cathode of an electrolytic cell. After deposition of a layer of the refractcry metal on the cathode, the cathode is heated sufficiently to effect thermal diffusion of the intermetallic compoundforming element from the base metal into the refractory layer.
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-12-016051
- OSTI ID:
- 4300161
- Journal Information:
- Nuclear Eng., Journal Name: Nuclear Eng. Vol. Vol: 3
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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