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Title: Numerical modeling of a plasma wakefield light source

Conference ·
OSTI ID:42992
;  [1]
  1. Los Alamos National Lab., NM (United States)

The possibility of generating very large longitudinal electric fields in a plasma has stimulated a large body of work on the application of those fields to advanced particle accelerator concepts. The strong electric fields are associated with large-amplitude electrostatic plasma waves which can be excited by various mechanisms, such as illumination by two intense laser beams whose beatwave coincides with the desired electrostatic wave in the plasma. Another mechanism for the excitation of large-amplitude electrostatic waves in a plasma is injection of short pulses of relativistic particles. The latter mechanism can lead to a very large deceleration ({approximately} 50% fractional energy loss) of the driving particle beam in a short length ({approximately}1 cm) of plasma, thereby depositing a large energy density into the plasma. The plasma wakefield light source concept utilizes the energy deposited by the beam in a weakly ionized ({approximately} 0.1%) gaseous target to produce energetic secondary electrons which ionize and excite the background material. The resulting radiation, which may constitute up to {approximately} 1% of the deposited energy, can efficiently illuminate an advanced projection lithography station with {approximately} 100 eV photons, provided the working gas is appropriately chosen. The authors present results of a computational study of the basic mechanisms of this device. Results of 2 1/2-dimensional, cylindrically symmetric, simulations with the ISIS code will be exhibited.

OSTI ID:
42992
Report Number(s):
CONF-940604-; ISBN 0-7803-2006-9; TRN: IM9521%%156
Resource Relation:
Conference: 1994 Institute of Electrical and Electronic Engineers (IEEE) international conference on plasma science, Santa Fe, NM (United States), 6-8 Jun 1994; Other Information: PBD: 1994; Related Information: Is Part Of IEEE conference record -- Abstracts; PB: 252 p.
Country of Publication:
United States
Language:
English

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