Photoelectrochemical study of pitting on iron in borate buffer solution containing inhibitor
- Peking Univ., Beijing (China). Dept. of Chemistry
The photoelectrochemical behavior and the susceptibility of iron to pitting in borate buffer containing chloride ions (Cl{sup {minus}}) were investigated in the presence and absence of inhibitor PC-604, which is a mixture of polyhydric alcohol phosphoric easter and polyphosphoric ester of various molecular weights. Measurements of the band gap (E{sub g}) of the passive film on iron showed inhibitor concentration and passivation time did not interfere with E{sub g}. Photocurrent and photocurrent transients increased with increasing inhibitor quantities and passivation times at constant potential. The decay time-constant of the photocurrent transient was investigated as a specific parameter of the film. Data showed this parameter was related to pitting susceptibility of the passive film on iron.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 427756
- Journal Information:
- Corrosion, Journal Name: Corrosion Journal Issue: 1 Vol. 53; ISSN 0010-9312; ISSN CORRAK
- Country of Publication:
- United States
- Language:
- English
Similar Records
Iron passivity in borate buffer: Formation of a deposit layer and its influence on the semiconducting properties
In situ X-ray absorption near edge structure study of the potential dependence of the formation of the passive film on iron in borate buffer
Comparison of the semiconductive properties of sputter-deposited iron oxides with the passive film on iron
Journal Article
·
Sat Jan 31 23:00:00 EST 1998
· Journal of the Electrochemical Society
·
OSTI ID:599922
In situ X-ray absorption near edge structure study of the potential dependence of the formation of the passive film on iron in borate buffer
Journal Article
·
Tue Jul 01 00:00:00 EDT 1997
· Journal of the Electrochemical Society
·
OSTI ID:533118
Comparison of the semiconductive properties of sputter-deposited iron oxides with the passive film on iron
Journal Article
·
Sat Jan 31 23:00:00 EST 1998
· Journal of the Electrochemical Society
·
OSTI ID:599886