Negative ion measurements in ECR plasmas
Conference
·
OSTI ID:423058
- Univ. of Wisconsin, Madison, WI (United States). Engineering Research Center for Plasma-Aided Manufacturing
- Hanyang Univ., Ansan (Korea, Republic of)
- Tegal Corp., Petaluma, CA (United States)
The presence of negative ions can have big effects on the plasma potential, spatial plasma profiles and plasma density. Negative ions also serve as the precursor for particle formation. Significant concentrations of negative ions have already been identified in low power-high pressure capacitively coupled fluorocarbon plasmas. The main goal of this study is to determine what conditions, if any, give rise to significant negative ion densities in fluorocarbon plasma in an ECR tool. For this purpose, a redesigned omegatron mass spectrometer was employed in an ECR etching plasma, operated at pressures of 0.2 {approximately} 5 mTorr. The main directions of this experiment are (1) to investigate the geometric effect to maximize the resolution of the omegatron and (2) to study the microwave power and neutral pressure dependence for the negative ion species in ECR fluorocarbon etching plasmas.
- Sponsoring Organization:
- National Science Foundation, Washington, DC (United States)
- OSTI ID:
- 423058
- Report Number(s):
- CONF-960634--
- Country of Publication:
- United States
- Language:
- English
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