Non-Joule electron heating in a weakly-collisional inductively coupled plasma
- Univ. of Houston, TX (United States). Plasma Processing Lab.
Low-pressure inductively coupled plasmas (ICP) offer new opportunities for materials processing. The microelectronics industry requires a plasma as free of collisions as possible.The electron heating in a weakly-collisional ICP is a result of complicated nonlocal electron interactions with spatially inhomogeneous electromagnetic fields, reflections from the plasma boundaries and collisions with neutral particles. This heating regime differs essentially from the collisional (Joule) heating which dominates at higher gas pressures. The authors have studied electron dynamics in a cylindrical ICP for given distributions of the fields. The focus of the present paper is the influence of oscillatory magnetic field and finite dimensions of the plasma on electron dynamics and the heating processing.
- OSTI ID:
- 423049
- Report Number(s):
- CONF-960634--
- Country of Publication:
- United States
- Language:
- English
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