Correlation between short range order defects and electron trap level spectra in amorphous SiO$sub 2$ layers obtained by TSEE technique
Conference
·
OSTI ID:4218850
- ed.
- Research Organization:
- Univ., Rostock, Ger.
- NSA Number:
- NSA-32-011923
- OSTI ID:
- 4218850
- Report Number(s):
- CONF-731008-
- Resource Relation:
- Conference: 4. international symposium on exoelectron emission and dosimetry, Liblice, Czechoslovakia, 1 Oct 1973; Other Information: Orig. Receipt Date: 31-DEC-75; Related Information: 4th international symposium on exoelectron emission and dosimetry, Liblice, Czechoslovakia, October 1--3, 1973
- Country of Publication:
- Costa Rica
- Language:
- English
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Related Subjects
N50140* -Metals
Ceramics
& Other Materials-Ceramics & Cermets-Radiation Effects
N50130 -Metals
Ceramics
& Other Materials-Ceramics & Cermets-Properties
Structure & Phase Studies
*SILICON OXIDES- PHYSICAL RADIATION EFFECTS
AMORPHOUS STATE
CRYSTAL DEFECTS
ELECTRON EMISSION
ELECTRONIC STRUCTURE
ENERGY LEVELS
ENERGY SPECTRA
GLOW CURVE
NEUTRONS
PEAKS
TRAPPED ELECTRONS
TRAPPING
Ceramics
& Other Materials-Ceramics & Cermets-Radiation Effects
N50130 -Metals
Ceramics
& Other Materials-Ceramics & Cermets-Properties
Structure & Phase Studies
*SILICON OXIDES- PHYSICAL RADIATION EFFECTS
AMORPHOUS STATE
CRYSTAL DEFECTS
ELECTRON EMISSION
ELECTRONIC STRUCTURE
ENERGY LEVELS
ENERGY SPECTRA
GLOW CURVE
NEUTRONS
PEAKS
TRAPPED ELECTRONS
TRAPPING