Parametric studies in a small plasma focus device
- Univ. Catolica de Chile, Santiago (Chile). Facultad de Fisica
- Ecole Polytechnique, Palaiseau (France)
Very high temperature and density plasmas can be produced in modest size plasma focus devices at the kJ level. Much of the scaling parameters on the plasma focus have been evaluated, though many questions still remain. The modest cost and simple construction allows easy modification to the device and the discharge parameters. In this paper the authors report on a small plasma focus device, which is set-up to investigate the effect of some of those modifications on the plasma, with detailed experimental diagnostics. Experiments have been carried out in various gases and with mixtures of different ratios. Extended operating range from below 0.5 torr upwards has been achieved with the implementation of the auxiliary discharge circuit. Despite the low voltage and low energy operation, energetic beam formation has been observed at the time of the final compression, prior to disruption. Current sheath formation and evolution has been characterized using the magnetic probes array, in correlation with beam formation and plasma emission. The relationship of the current sheath structure and that of the pinched plasma, as shown by the filtered X-ray pinhole camera, has been investigated.
- OSTI ID:
- 419760
- Report Number(s):
- CONF-960634-; TRN: 97:002075
- Resource Relation:
- Conference: 1996 IEEE international conference on plasma science, Boston, MA (United States), 3-5 Jun 1996; Other Information: PBD: 1996; Related Information: Is Part Of IEEE conference record -- Abstracts: 1996 IEEE international conference on plasma science; PB: 324 p.
- Country of Publication:
- United States
- Language:
- English
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