Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Antenna coupling and absorption mechanisms in a helicon source operation

Conference ·
OSTI ID:419665
; ;  [1]
  1. Univ. of Wisconsin, Madison, WI (United States). Dept. of Electrical and Computer Engineering
The ANTENAII computer code, a modified version of the ANTENA code written by McVey, is used to study and model helicon sources. A drifting beam with a small Maxwellian spread characterizing the fast electrons along with the bulk Maxwellian electron distribution comparable to what has been observed experimentally has been added to the code to examine their influence on helicon wave power absorption. The authors have studied the effects of electron cyclotron damping on power absorption that can occur at low magnetic fields (B {approx} 1 {minus} 50 G). The contribution of the off-diagonal hot plasma dielectric tensor terms and that of the transit-time damping to the power dissipated is also examined. They examine different helicon antenna structures and describe the relative processes of wave absorption by collisional, Landau, transit-time and cyclotron damping for a wide range of parameters. Preliminary studies of plasma transport as well as radial plasma uniformity in helicon sources are presented with the aid of the interface of the ANTENAII code with the 2-D fluid transport model, INDUCT95, developed by Vittelo et al.
Sponsoring Organization:
Wisconsin Univ., Madison, WI (United States)
OSTI ID:
419665
Report Number(s):
CONF-960634--
Country of Publication:
United States
Language:
English

Similar Records

Modeling of profile effects for inductive helicon plasma sources
Conference · Sat Dec 30 23:00:00 EST 1995 · OSTI ID:160766

Modeling of profile effects for inductive helicon plasma sources
Journal Article · Wed Jan 31 23:00:00 EST 1996 · IEEE Transactions on Plasma Science · OSTI ID:244955

Wave propagation and absorption simulations for helicon sources
Journal Article · Mon Nov 30 23:00:00 EST 1998 · Physics of Plasmas · OSTI ID:664689