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U.S. Department of Energy
Office of Scientific and Technical Information

Magnetically controlled deposition of metals using gas plasma. Quarterly progress report, July--September 1996

Technical Report ·
DOI:https://doi.org/10.2172/418387· OSTI ID:418387
Objective is to develop a method of spraying materials on a substrate in a controlled manner to eliminate the waste inherent in present plating processes. The process under investigation is magnetically controlled plasma spraying. The field equations have been cast in a format that allows finite element solution. Potential flow and finite element solutions for temperature isolines and velocity vectors are compared for 2-D flow with heat addition.
Research Organization:
Idaho Univ., Moscow, ID (United States). Dept. of Mechanical Engineering
Sponsoring Organization:
USDOE Office of Environmental Restoration and Waste Management, Washington, DC (United States)
DOE Contract Number:
FG07-93ID13220
OSTI ID:
418387
Report Number(s):
DOE/ID/13220--T8; ON: DE97000853
Country of Publication:
United States
Language:
English