Magnetically controlled deposition of metals using gas plasma. Quarterly progress report, July--September 1996
Objective is to develop a method of spraying materials on a substrate in a controlled manner to eliminate the waste inherent in present plating processes. The process under investigation is magnetically controlled plasma spraying. The field equations have been cast in a format that allows finite element solution. Potential flow and finite element solutions for temperature isolines and velocity vectors are compared for 2-D flow with heat addition.
- Research Organization:
- Idaho Univ., Moscow, ID (United States). Dept. of Mechanical Engineering
- Sponsoring Organization:
- USDOE Office of Environmental Restoration and Waste Management, Washington, DC (United States)
- DOE Contract Number:
- FG07-93ID13220
- OSTI ID:
- 418387
- Report Number(s):
- DOE/ID/13220--T8; ON: DE97000853
- Country of Publication:
- United States
- Language:
- English
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