INCORPORATION OF RADIOACTIVE W$sup 185$ DURING THE ANODIC FORMATION OF A FILM OF Al$sub 2$$O$$sub 3$ (in Russian)
Journal Article
·
· Zhur. Priklad. Khim.
OSTI ID:4138461
The problem of electrcplating Ti is compllcated by the presence of a tenacious oxide layer on the surface, necessitating a chemical pretreatment of the metal by pickling with an etehing solution containing various amounts of ethylene glycol, HNO/sub 3/, HF, acetic acid, or ZnF/sub 2/. Depcsits of Cr, Cu, and Ni were prepared using modifications of the usual plating baths and experimental conditions. Heat treatment in vacuum of the 8 to 10 ation base coat resulted in increased adherence, allowing a second deposition, forming 80 to 150 ation layers. The adherence was measured by means of flexing and scratching tests. (TTT)
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-14-019397
- OSTI ID:
- 4138461
- Journal Information:
- Zhur. Priklad. Khim., Journal Name: Zhur. Priklad. Khim. Vol. Vol: 33
- Country of Publication:
- Country unknown/Code not available
- Language:
- Russian
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