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U.S. Department of Energy
Office of Scientific and Technical Information

ION SOURCE

Patent ·
OSTI ID:4134810

An improved ion source is described which provides intense ion beams with minimum molecule egress from the source; it comprises an ionization chamber in which an annular anode is positioned between a filament and an electrode, the latter of a relatively small surface area. Electron oscillation or refluxing is employed to provide elongated electron paths for increased ionization. An arc plasma is produced by electron discharge in a gaseous atmosphere to provide a large ion reservoir. Since ion and electron bombardment produces heat, the anode is cooled by fins. (D.L.C.)

Research Organization:
Originating Research Org. not identified
NSA Number:
NSA-14-026128
OSTI ID:
4134810
Report Number(s):
GB 843648
Country of Publication:
United Kingdom
Language:
English

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