THE PRODUCTION OF INTERSTITIAL POINT DEFECTS BY LOW ENERGY ION BOMBARDMENT

Journal Article · Thu Aug 01 04:00:00 EDT 1963 · Journal of Nuclear Materials (Netherlands)

DOI:https://doi.org/10.1016/0022-3115(63)90151-X· OSTI ID:4133440

Bowden, P; Brandon, D G

Thin foils of gold, copper, and nickel, prepared for examination in the electron microscope, were bombarded on one surface with a beam of 100 ev singly charged argon ions at normal incidence and were then examined. Dislocation loops were produced near the bombarded surface and it is demonstrated that they are formed by the agglomeration of interstitial point defects. It is suggested that the point defects are injected to a depth in the foil by replacement collision sequences initiated at the surface, and that they subsequently cluster to form dislocation loops. The effect of the temperature of the specimen during bombardment on the damage observed in copper and gold suggests that the point defects that form the damage migrate in the temperature range around 0 deg C, the range normally associated with stage III resistivity annealing in these metals. (auth)

• Research Organization: Cambridge Univ., Eng.
• NSA Number: NSA-18-005828
• OSTI ID: 4133440
• Journal Information: Journal of Nuclear Materials (Netherlands), Journal Name: Journal of Nuclear Materials (Netherlands) Vol. Vol: 9; ISSN JNUMA
• Country of Publication: Country unknown/Code not available
• Language: English

Related Subjects

ANNEALING
ARGON
COPPER
DEFECTS
DISLOCATIONS
ELECTRON MICROSCOPY
FOILS
GOLD
ION BEAMS
METALS, CERAMICS, AND OTHER MATERIALS
NICKEL
PRODUCTION
TEMPERATURE