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Title: METHOD FOR ELECTRODEPOSITING POLONIUM

Patent ·
OSTI ID:4126605

The deposition of a thick uniform layer of polonium metal from aqueous solutions can be carried out by electrolyzing an aqueous solution of 1 N hydrofluoric acid containing about 0.13 curie of polonium per cubic centimeter of solution with platinum electrodes and a current density of about 1.2 ma/cm/sup 2/ of cathode surface.

Research Organization:
Originating Research Org. not identified
NSA Number:
NSA-14-025880
Assignee:
U.S. Atomic Energy Commission
Patent Number(s):
US 2951020
OSTI ID:
4126605
Resource Relation:
Other Information: Orig. Receipt Date: 31-DEC-60
Country of Publication:
United States
Language:
English