Depth profile analysis apparatus
An apparatus and method for depth profile analysis is described in which atoms are removed from a surface by sputtering thereby forming a crater from successively exposed portions of a solid, which portions are then elementally analyzed. The improvement of the present invention comprises deflecting a primary ion beam across the surface to form a crater extending about a predetermined region of the surface and enabling the production of a signal indicative of surface atoms of a given mass only when the primary ion beam is impinging upon a smaller portion of the predetermined region, thereby ensuring that the signal is representative of atoms within the smaller portion, such as at the bottom of the crater. (auth)
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-33-014959
- Assignee:
- to Minnesota Mining and Manufacturing Co.
- Patent Number(s):
- US 3916190
- OSTI ID:
- 4102368
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
440105* --Instrumentation--Radiation Instrumentation-- Radiometric Instruments
DESIGN
ION PROBES
N40130 - -Chemistry--Analytical & Separations Chemistry--Radiometric & Radiochemical Procedures
N46200* --Instrumentation--Radiometric Instruments
SPUTTERING
SURFACES