Relative sputtering yields and quantitative surface analysis by Auger spectroscopy
During the past few years, the qualitative analysis of surfaces by Auger electron spectroscopy has become an accepted analytical technique. With all analytical techniques, however, the ultimate goal is to obtain quantitative information. This paper presents data on the relative sputtering yield of several elements obtained by studying the surface composition of alloy systems (Cr-Pd, Ag-Pd, Cu-Pd, Mn-Ag-Pd and Nb-U) varying in composition from a few to roughly fifty atomic percent. The reported measurements were taken while sputtering after the alloy surface had reached a steady-state composition. Peak heights were referenced to in situ standards of the pure alloy components. Multiple determinations were carried out over a period of several weeks in order to check the reproducibility and to estimate the standard deviation in the data. This information was used to obtain uncertainty limits for the calculated sputtering yields. (auth)
- Research Organization:
- Sandia Labs., Livermore, Calif. (USA)
- DOE Contract Number:
- AT(29-1)-789
- NSA Number:
- NSA-33-019650
- OSTI ID:
- 4098900
- Report Number(s):
- SAND-75-8680; CONF-751023-5
- Resource Relation:
- Conference: 22. national vacuum symposium, Philadelphia, Pennsylvania, USA, 28 Oct 1975; Other Information: Orig. Receipt Date: 30-JUN-76
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
400104* -Chemistry-Analytical & Separations Chemistry- Spectral Procedures
AUGER ELECTRON SPECTROSCOPY- CHROMIUM ALLOYS- PALLADIUM ALLOYS
CHEMICAL COMPOSITION
COPPER ALLOYS- PALLADIUM ALLOYS
ERRORS
NIOBIUM ALLOYS- URANIUM ALLOYS
PALLADIUM ALLOYS- SILVER ALLOYS
SENSITIVITY
SPUTTERING MANGANESE ALLOYS- PALLADIUM ALLOYS- SILVER ALLOYS