Dielectric properties of films prepared by the reactive sputtering of Ta in O$sub 2$/N$sub 2$ mixtures
Journal Article
·
· Thin Solid Films, v. 30, no. 2, pp. 377-381
- Research Organization:
- Bell-Northern Research, Ottawa
- NSA Number:
- NSA-33-020648
- OSTI ID:
- 4082357
- Journal Information:
- Thin Solid Films, v. 30, no. 2, pp. 377-381, Other Information: Orig. Receipt Date: 30-JUN-76
- Country of Publication:
- China
- Language:
- English
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Related Subjects
N50130* -Metals
Ceramics
& Other Materials-Ceramics & Cermets-Properties
Structure & Phase Studies
360202* -Materials-Ceramics
Cermets & Refractories- Structure & Phase Studies
*TANTALUM OXIDES- DIELECTRIC PROPERTIES
AMORPHOUS STATE
BINARY MIXTURES
CONTROLLED ATMOSPHERES
ELECTRODES
NITROGEN
OXYGEN
SPUTTERING
TANTALUM
Ceramics
& Other Materials-Ceramics & Cermets-Properties
Structure & Phase Studies
360202* -Materials-Ceramics
Cermets & Refractories- Structure & Phase Studies
*TANTALUM OXIDES- DIELECTRIC PROPERTIES
AMORPHOUS STATE
BINARY MIXTURES
CONTROLLED ATMOSPHERES
ELECTRODES
NITROGEN
OXYGEN
SPUTTERING
TANTALUM