MICROGRAPHIC STUDY OF SLOW OXIDATION OF ZIRCONIUM (in French)
Journal Article
·
· Compt. Rend.
OSTI ID:4077509
Development of the oxide layer at 800--850 deg C on Van Arkel and zone- melted zirconium in slow oxygen at low pressures was studied. An indicated mechanlsm comprising preferential oxygen diffusion and subsequent saturation (29 at.%) at the grain boundaries, followed by oxide growth involving the entire grains, is discussed. Oriented needle patterns due to growth perpendicular to the grain boundaries at 850 deg C are illustrated. (TCO)
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-18-014414
- OSTI ID:
- 4077509
- Journal Information:
- Compt. Rend., Journal Name: Compt. Rend. Vol. Vol: 257
- Country of Publication:
- Country unknown/Code not available
- Language:
- French
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