Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
Patent
·
OSTI ID:403666
Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- SNL; SCA: 070201; PA: EDB-97:001291; SN: 96001695586
- Patent Number(s):
- US 5,577,092/A/
- Application Number:
- PAN: 8-378,426; TRN: 97:000141
- OSTI ID:
- 403666
- Resource Relation:
- Other Information: PBD: 19 Nov 1996
- Country of Publication:
- United States
- Language:
- English
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