SECONDARY ELECTRON EMISSION FROM COPPER-BERYLLIUM (4%) SURFACE BY BOMBARDMENT OF VARIOUS POSITIVE IONS
The secondary electron emissron from the non-activated and activated surfaces of copper-beryllium (4%) by the impacts of various noble gas and hydrocarbon rons was studied, and the surface structure was determined by electron diifraction analysis. The main results obtained are as follows: A thick layer of beryllium oxide is formed in the neighborhood of the target surface activated by oxygen at 350 to 480 deg C. Oxide films of copper are formed on the target surface by electropolishing, but these oxides are easily reduced by prolonged ion bombardment. The optimum temperature for electron yield activation seems to be about 420 deg C, and the electron yield for the activated target surface treated at 350 or 420 deg C is only slightly dependent upon the ion kinetic energy. No measurable decrease in the electron yield for an activated surface treated at 420 deg C was obtained by prolonged bombardments with various positive ions, while the electron yield for the non-activated surface decreases about 20% in prolonged bombardments. Under the experimental conditions used, the mechanism of electron ejection seems to be considerably complicated, and it is difficult to deduce any definite conclusion for the electron ejection process. (auth)
- Research Organization:
- Osaka Prefectural Univ., Univ. of Osaka Prefecture, Sakai, Japan
- Sponsoring Organization:
- USDOE
- NSA Number:
- NSA-15-016205
- OSTI ID:
- 4031603
- Journal Information:
- Bull. Chem. Soc. Japan, Journal Name: Bull. Chem. Soc. Japan Vol. Vol: 34
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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Related Subjects
BERYLLIUM OXIDES
CLEANING
CONFIGURATION
COPPER
DIFFRACTION
EFFICIENCY
ELECTROLYSIS
ELECTRONS
ELECTROPOLISHING
EMISSION
ENERGY
EXCITATION
FILMS
HYDROCARBONS
ION BEAMS
IONS
LAYERS
MEASURED VALUES
OXIDES
OXYGEN
PHYSICS
QUANTITATIVE ANALYSIS
RARE GASES
REDUCTION
SECONDARY EMISSION
SURFACES
TARGETS
TEMPERATURE