Double textured cylindrical block copolymer domains via directional solidification on a topographically patterned substrate
Directional solidification of cylinder forming block copolymer films confined between a directionally crystallizing solvent (benzoic acid) and a topographically patterned silicon substrate imparts a particular orientation to the block copolymer microdomains that is dependent of the solidification direction and the local film thickness. The substrate features (30 nm high, 2{mu}m wide square mesas on a 4{mu}m sq lattice) shape the film morphology by periodically modulating the local film thickness. Thicker regions between substrate features (plateaus) exhibit in-plane cylinders aligned in the crystallization direction and thinner regions over the substrate features (mesas) display vertically aligned cylindrical domains. This approach is a simple and general technique for engineering an intended domain orientation in specific areas of a block copolymer film. Development of this method for nanolithographic applications is demonstrated through oxygen plasma reactive ion etching of the patterned cylindrical domains. {copyright} 2001 American Institute of Physics.
- Sponsoring Organization:
- (US)
- OSTI ID:
- 40230725
- Journal Information:
- Applied Physics Letters, Vol. 79, Issue 6; Other Information: DOI: 10.1063/1.1389766; Othernumber: APPLAB000079000006000848000001; 018131APL; PBD: 6 Aug 2001; ISSN 0003-6951
- Publisher:
- The American Physical Society
- Country of Publication:
- United States
- Language:
- English
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