High energy chemical laser system
A high energy chemical laser system is described wherein explosive gaseous mixtures of a reducing agent providing hydrogen isotopes and interhalogen compounds are uniformly ignited by means of an electrical discharge, flash- photolysis or an electron beam. The resulting chemical explosion pumps a lasing chemical species, hydrogen fluoride or deuterium fluoride which is formed in the chemical reaction. The generated lasing pulse has light frequencies in the 3- micron range. Suitable interhalogen compounds include bromine trifluoride (BrF$sub 3$), bromine pentafluoride (BrF$sub 5$), chlorine monofluoride (ClF), chlorine trifluoride (ClF$sub 3$), chlorine pentafluoride (ClF$sub 5$), iodine pentafluoride (IF$sub 5$), and iodine heptafluoride (IF$sub 7$); and suitable reducing agents include hydrogen (H$sub 2$), hydrocarbons such as methane (CH$sub 4$), deuterium (D$sub 2$), and diborane (B$sub 2$$H$$sub 6$), as well as combinations of the gaseous compound and/or molecular mixtures of the reducing agent.
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-33-025803
- Assignee:
- to U.S. Energy Research and Development Administration
- Patent Number(s):
- PAT-APPL-543,611.; US 3928821
- OSTI ID:
- 4022059
- Country of Publication:
- United States
- Language:
- English
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