Topographic cross talk in reflection mode near-field optical microscopy on patterned structures
Journal Article
·
· Journal of Applied Physics
In scanning near-field optical microscopy the sample topography may have a strong effect on the optical image signal. This cross talk has been investigated in subwavelength-periodically patterned thin-film structures using a reflection-mode near-field optical microscope. A comparison between measured and simulated line scans shows that far-field light waves emitted from the tip aperture play a major role in the imaging process.{copyright} 2001 American Institute of Physics.
- Sponsoring Organization:
- (US)
- OSTI ID:
- 40204171
- Journal Information:
- Journal of Applied Physics, Vol. 89, Issue 12; Other Information: DOI: 10.1063/1.1364642; Othernumber: JAPIAU000089000012007727000001; 043110JAP; PBD: 15 Jun 2001; ISSN 0021-8979
- Publisher:
- The American Physical Society
- Country of Publication:
- United States
- Language:
- English
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