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Title: Granular growth of Fe{sub 3}O{sub 4} thin films and its antiphase boundaries prepared by pulsed laser deposition

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1358831· OSTI ID:40204069

Fe{sub 3}O{sub 4} thin film prepared by pulsed laser deposition on Si (100) substrate has been investigated by transmission electron microscopy from plane and cross-sectional views. The thin film, which shows a spinel structure as characterized by selected-area diffraction, is about 180 nm thick with granular growth of particle size about 50 nm. High resolution electron microscopy observations indicate reduced thickness of the native SiO{sub 2} layer between the thin film and Si due to rastering of the substrate surface by an unfocused laser beam before the deposition. By using a 220 diffraction spot in two beam condition near the {l_angle}001{r_angle} axis of a single Fe{sub 3}O{sub 4} grain, antiphase boundaries (APBs) inside the grains could be clearly resolved. The existence of APBs in the thin film is consistent with the magnetic experiments including an open hysteresis loop and unsaturated magnetization in relatively high magnetic fields. This study suggests that APBs are not unique to Fe{sub 3}O{sub 4} films grown on MgO substrates. {copyright} 2001 American Institute of Physics.

Sponsoring Organization:
(US)
OSTI ID:
40204069
Journal Information:
Journal of Applied Physics, Vol. 89, Issue 11; Other Information: DOI: 10.1063/1.1358831; Othernumber: JAPIAU000089000011007398000001; 376111MMM; PBD: 1 Jun 2001; ISSN 0021-8979
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English