Dependence of the coercive field on the Cu overlayer thickness in thin Co/Cu(001) and Ni/Cu(001) fcc epitaxial films
We have studied the effect of the Cu overlayer thickness t{sup Cu} on the coercive field H{sub c} of epitaxial ultrathin fcc Co/Cu(001) and Ni/Cu(001) films by magneto-optic Kerr effect magnetometry. The Cu/40 Aa Ni/Cu(001) system shows perpendicular magnetic anisotropy (PMA) for the whole t{sup Cu} range studied (20{endash}180 Aa) with H{sub c} showing a large, linear increase with t{sup Cu} (from {similar_to}280 to {similar_to}360 Oe). On the other hand, the Cu/36 Aa Co/Cu(001) structure has dominant in-plane anisotropy and in contradistinction with the Ni case the coercive field decreases rapidly with t{sup Cu} (from 140 Oe for t{sup Cu}=20Aa to {similar_to}90 Oe at t{sup Cu}{similar_to}180Aa). The variation in coercivity is described in terms of the magnetoelastic energy contribution to the magnetic anisotropy induced by the Cu overlayers (via strain). In particular, the increase in the H{sub c} of Ni is attributed to an increase in the PMA while the relation between the magnetic anisotropy and coercivity in the case of Co remains unclear. {copyright} 2001 American Institute of Physics.
- Sponsoring Organization:
- (US)
- OSTI ID:
- 40204061
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 89; ISSN 0021-8979
- Publisher:
- The American Physical Society
- Country of Publication:
- United States
- Language:
- English
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