NEW METALLOGRAPHIC TECHNIQUES FOR THE EXAMINATION OF URANIUM, URANIUM ALLOYS AND URANIUM DIOXIDE

Journal Article · Mon May 01 00:00:00 EDT 1961 · J. Nuclear Materials

DOI:https://doi.org/10.1016/0022-3115(61)90153-2· OSTI ID:4002875

Ambler, J F.R.; Slattery, G F

An attack-polish reagent was developed for the metallographic preparation of uranium alloys and uranium dioxide. The reagent consists of a slurry of hydrogen peroxide (30 wt.%) and 5% gamma -alumina. Polishing is carried out on a polythene lap covered with terylene velvet. The method has many advantages over the standard electro-polishing techniques used for uranium and uranium alloys. A new electrolytic etching technique described, for the study of the grain structure of uranium and uranium alloys using bright field illumination, provides a useful alternative to polarized light methods. The reagent is composed of ammonium persulphate/glycerol/water. A new stain etch using hydrogen peroxide (30 wt.%) was developed for the general examination of grain size and distribution in uranium dioxide sintered compacts and is also ideal for studying duplex U0/sub 2/ and U/sub 4/O/sub 9/ phase structures. The results obtained by these new techniques are discussed, using specific metallographic structures as examples. (auth)

• Research Organization: United Kingdom Atomic Energy Authority, Springfields, Lancs, Eng.
• NSA Number: NSA-15-026586
• OSTI ID: 4002875
• Journal Information: J. Nuclear Materials, Journal Name: J. Nuclear Materials Vol. Vol: 4
• Country of Publication: Country unknown/Code not available
• Language: English

Related Subjects

ALCOHOLS
ALUMINUM OXIDES
AMMONIUM COMPOUNDS
CLEANING
CONFIGURATION
DISTRIBUTION
ELECTROLYSIS
ETCHING
GRAIN SIZE
HYDROGEN PEROXIDES
LIGHT
METALLOGRAPHY
METALS, CERAMICS, AND OTHER MATERIALS
PERSULFATES
POLARIZATION
POLYETHYLENES
POLYMERS
SINTERED MATERIALS
SLURRIES
SULFATES
TEXTILES
URANIUM
URANIUM ALLOYS
URANIUM DIOXIDE
WATER