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The effect of a GaN nucleation layer on GaN film properties grown by metalorganic chemical vapor deposition

Book ·
OSTI ID:394957
; ;  [1]; ;  [2]; ; ;  [3]
  1. Univ. of Gent-IMEC (Belgium). Dept. of Information Technology
  2. Thomas Swan and Co., Ltd., Cambridge (United Kingdom)
  3. Univ. of Strathclyde, Glasgow (United Kingdom)

In this paper GaN films are examined, which are grown on basal plane (0001) sapphire substrates. Growth is performed in a novel type of vertical rotating disk reactor.Results on the effect of a GaN nucleation layer on the properties of the overgrown GaN epilayer are presented. Characterization includes surface morphology studies, DC x-ray diffraction and optical characterization. Best film quality so far has a double crystal X-ray half width of 85 arcsec at approximately 1 {micro}m thickness.

OSTI ID:
394957
Report Number(s):
CONF-951155--; ISBN 1-55899-298-7
Country of Publication:
United States
Language:
English