The surface chemistry of triallylamine on Si(111) and its coadsorption with triethylgallium

Book · Fri Nov 01 04:00:00 EST 1996

OSTI ID:394936

Freundt, D; Landmesser, G; Lueth, H ^[1]; Rizzi, A ^[2]

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1. Forschungszentrum Juelich (Germany). Inst. fuer Schicht- und Ionentechnik
2. Univ. di Modena (Italy). Dipt. di Fisica

The surface chemistry of Triallylamine (TAA), (C{sub 3}H{sub 5}){sub 3}N on Si(111) has been studied by adsorption under UHV conditions and in-situ characterization. High Resolution Electron Energy Loss Spectroscopy (HREELS) yields the spectrum of vibration modes at the surface, and X-ray Photoelectron Spectroscopy (XPS) yields the chemical bonding and the partial concentration of the different adsorbates in the near surface region. The tertiary amine TAA physisorbs at RT without dissociation. Successive annealing steps of the physisorbed phase induce the dissociation of the amine at 400 C. At higher temperatures the allyl groups are partially desorbed and the rest fully dissociated at 600 C, where the hydrogen leaves the surface and the nitrogen and carbon start to diffuse into the Si substrate. A very similar behavior is observed for the adsorption of TAA on a heated Si substrate. The coadsorption with Triethylgallium (TEG) in the temperature range 500--800 C does not induce significant changes in the reaction at the Si surface. A negligible quantity of Ga is detected at the surface after codeposition in the whole investigated temperature range. The growth of a GaN phase has not been observed, neither on Si(111) nor on Al{sub 2}O{sub 3}(0001) substrates.

• OSTI ID: 394936
• Report Number(s): CONF-951155--; ISBN 1-55899-298-7
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
40 CHEMISTRY
ADSORPTION
BINDING ENERGY
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
ELECTRON DIFFRACTION
ENERGY-LOSS SPECTROSCOPY
EXPERIMENTAL DATA
GALLIUM NITRIDES
ORGANOMETALLIC COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
SURFACE PROPERTIES
TEMPERATURE DEPENDENCE