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Title: Elliptically polarizing undulator beamlines at the Advanced Light Source

Abstract

Circular polarization insertion devices and beamlines at the Advanced Light Source are described. The facility will consist of multiple undulators feeding two independent beamlines, one optimized for microscopy and the other for spectroscopy. The energy range of the beamlines will go from below 100 eV to 1800 eV, enabling studies of the magnetically important L{sub 2,3} edges of transition metals and the M{sub 4,5} edges of rare earths. {copyright} {ital 1996 American Institute of Physics.}

Authors:
; ; ; ; ; ;  [1]
  1. Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States)
Publication Date:
Research Org.:
Lawrence Berkeley National Laboratory
OSTI Identifier:
389615
Report Number(s):
CONF-9510119-
Journal ID: RSINAK; ISSN 0034-6748; TRN: 96:028029
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 67; Journal Issue: 9; Conference: SRI `95: synchrotron radiation instrumentation symposium and the 7. users meeting for the advanced photon source (APS), Argonne, IL (United States), 16-20 Oct 1995; Other Information: PBD: Sep 1996
Country of Publication:
United States
Language:
English
Subject:
44 INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS; ADVANCED LIGHT SOURCE; BEAM TRANSPORT; SYNCHROTRON RADIATION; X RADIATION; PHOTON BEAMS; EV RANGE 100-1000; KEV RANGE 01-10; POLARIZATION; USES; OPTICAL SYSTEMS

Citation Formats

Young, A T, Hoyer, E, Marks, S, Martynov, V, Padmore, H, Plate, D, and Schlueter, R. Elliptically polarizing undulator beamlines at the Advanced Light Source. United States: N. p., 1996. Web. doi:10.1063/1.1147337.
Young, A T, Hoyer, E, Marks, S, Martynov, V, Padmore, H, Plate, D, & Schlueter, R. Elliptically polarizing undulator beamlines at the Advanced Light Source. United States. doi:10.1063/1.1147337.
Young, A T, Hoyer, E, Marks, S, Martynov, V, Padmore, H, Plate, D, and Schlueter, R. Sun . "Elliptically polarizing undulator beamlines at the Advanced Light Source". United States. doi:10.1063/1.1147337.
@article{osti_389615,
title = {Elliptically polarizing undulator beamlines at the Advanced Light Source},
author = {Young, A T and Hoyer, E and Marks, S and Martynov, V and Padmore, H and Plate, D and Schlueter, R},
abstractNote = {Circular polarization insertion devices and beamlines at the Advanced Light Source are described. The facility will consist of multiple undulators feeding two independent beamlines, one optimized for microscopy and the other for spectroscopy. The energy range of the beamlines will go from below 100 eV to 1800 eV, enabling studies of the magnetically important L{sub 2,3} edges of transition metals and the M{sub 4,5} edges of rare earths. {copyright} {ital 1996 American Institute of Physics.}},
doi = {10.1063/1.1147337},
journal = {Review of Scientific Instruments},
number = 9,
volume = 67,
place = {United States},
year = {1996},
month = {9}
}