Elliptically polarizing undulator beamlines at the Advanced Light Source

Journal Article · Sun Sep 01 04:00:00 EDT 1996 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1147337· OSTI ID:389615

Young, A T; Hoyer, E; Marks, S; Martynov, V; Padmore, H; Plate, D; Schlueter, R ^[1]

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1. Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States)

Circular polarization insertion devices and beamlines at the Advanced Light Source are described. The facility will consist of multiple undulators feeding two independent beamlines, one optimized for microscopy and the other for spectroscopy. The energy range of the beamlines will go from below 100 eV to 1800 eV, enabling studies of the magnetically important L{sub 2,3} edges of transition metals and the M{sub 4,5} edges of rare earths. {copyright} {ital 1996 American Institute of Physics.}

• Research Organization: Lawrence Berkeley National Laboratory
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 389615
• Report Number(s): CONF-9510119--
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 9 Vol. 67; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
ADVANCED LIGHT SOURCE
BEAM TRANSPORT
EV RANGE 100-1000
KEV RANGE 01-10
OPTICAL SYSTEMS
PHOTON BEAMS
POLARIZATION
SYNCHROTRON RADIATION
USES
X RADIATION