Chemical behavior in diffusion bonding of Si{sub 3}N{sub 4}-Ni and Si{sub 3}N{sub 4}-superalloy IN-738

Journal Article · Sun Sep 15 04:00:00 EDT 1996 · Scripta Materialia

DOI:https://doi.org/10.1016/1359-6462(96)00161-3· OSTI ID:382535

Chen, Y C; Iwamoto, C; Ishida, Y ^[1]

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1. Univ. of Tokyo (Japan). Dept. of Material Science

The bulk chemical reactions between Si{sub 3}N{sub 4} and Ni have been investigated from a thermodynamics perspective by Klomp et al. and Heikinheimo et al., and from experiments by Suganuma et al., Schuster et al., Brito et al., Ishikawa et al., and Heikinheimo et al. The chemical interaction between Si{sub 3}N{sub 4} and Ni-based alloy was investigated by Benett et al., Mehan et al., and Peteves et al. In this work, instead of the Ni-Cr, or model Ni-based superalloy (Ni-Cr-Al alloy), the industrial superalloy, IN-738, was used. For comparing the different chemical behaviors between the pure Ni and Ni-based superalloy with Si{sub 3}N{sub 4}, solid state diffusion bonding of Ni/Si{sub 3}N{sub 4} and IN-738/Si{sub 3}N{sub 4} were bonded in the same bonding conditions, except Ni/Si{sub 3}N{sub 4} specimens whose bonding time were longer than that of IN-738/Si{sub 3}N{sub 4} specimen.

• OSTI ID: 382535
• Journal Information: Scripta Materialia, Journal Name: Scripta Materialia Journal Issue: 6 Vol. 35; ISSN XZ503X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM OXIDES
BONDING
CHEMICAL REACTIONS
COMPOSITE MATERIALS
INCONEL 738
INTERFACES
NICKEL
POLISHING
SAMPLE PREPARATION
SILICON NITRIDES
SURFACE CLEANING
TIME DEPENDENCE
TRANSMISSION ELECTRON MICROSCOPY
YTTRIUM OXIDES