Electron irradiation induced chemical vapor deposition of titanium chloride on gold and on magnesium chloride thin films. Surface characterization by AES, XPS, and TPD
- Univ. of California, Berkeley, CA (United States)
The electron irradiation induced TiCl{sub 4} deposition on a gold polycrystalline foil and on a Au (100) single crystal in ultra-high vacuum conditions is reported. Titanium chloride ultrathin films are prepared at 250-300 K by irradiation of the substrate with 1 keV electrons in a background pressure of TiCl{sub 4} of 1 x 10{sup -8} to 5 x 10{sup -7} Torr. The deposited films are characterized by AES, XPS, and temperature-programmed desorption (TPD). We can grow titanium chloride films of the maximum thickness of about 25 A under our experimental conditions. The film consists of 3-4 layers of TiCl{sub 2} with 1 monolayer of TiCl{sub 4} chemisorbed on its surface. A comparison is made with the titanium chloride film grown on MgCl{sub 2} ultrathin films by electron irradiation induced TiCl{sub 4} deposition as previously reported. This film is very similar to the titanium chloride film deposited on Au and can be described as few layers of TiCl{sub 2} deposited on a defective MgCl{sub 2-x} film. One monolayer of TiCl{sub 4} is chemisorbed on the TiCl{sub 2} surface. 24 refs., 10 figs., 2 tabs.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 380769
- Journal Information:
- Journal of Physical Chemistry, Journal Name: Journal of Physical Chemistry Journal Issue: 35 Vol. 100; ISSN JPCHAX; ISSN 0022-3654
- Country of Publication:
- United States
- Language:
- English
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