Corrosion inhibition on copper using self-assembled monolayers and multilayers
- Massachusetts Institute of Technology, Cambridge, MA (United States)
We have used self-assembled monolayers and multilayer on copper as barrier films towards oxidation of the underlying copper substrate. The self-assembled films form by a spontaneous adsorptive process onto the copper surface. These layers are strongly bonded to the copper surface, and the films impart a significant level of corrosion inhibition to the underlying copper substrate. The hydrophobic nature of the adsorbed layer is responsible for inhibiting corrosion in the presence of water - a condition where the corrosion of untreated copper is rapid. As these chemisorbed hydrocarbon films are crystalline and densely packed, they are well-configured to limit the transport of O{sub 2} and other molecular species to the metal surface. Multilayered assemblies containing alkylsiloxane networks assembled on the alkanethiolate SAM provide a means for generating thicker, more robust hydrocarbon films by the self-assembly process. The abilities of these and other multilayered films to inhibit the corrosion and dissolution of the copper substrate will be described.
- OSTI ID:
- 370925
- Report Number(s):
- CONF-960376--
- Country of Publication:
- United States
- Language:
- English
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