The growth and structure of ultrathin CR films on PT(111)
Conference
·
OSTI ID:370184
- Tulane Univ., New Orleans, LA (United States)
The growth, structure and morphology of ultrathin Cr films on Pt(111) were studied using ISS, XPS, LEED and STM. The films were prepared by vapor phase deposition of chromium metal in ultrahigh vacuum with a deposition rate of 0.1{Angstrom}/min. The thickness of the films ranges from 0.2 to 4 monolayer as monitored by a quartz crystal microbalance. STM and LEED measurements reveal that several monolayers thick Cr films grow in three dimensional islands along three directions, which reflects the hexagonal symmetry of the Pt(111) substrate. During annealing at temperatures between 50 and 600{degrees}C, Pt atoms diffuse gradually into the overlayer; this diffusion saturates at high temperature to form a surface alloy of stable composition and structure.
- OSTI ID:
- 370184
- Report Number(s):
- CONF-960376--
- Country of Publication:
- United States
- Language:
- English
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