Isotopic study of metalorganic chemical vapor deposition of (Ba, Sr)TiO{sub 3} films on Pt
- Pacific Northwest National Laboratory, Richland, Washington 99352 (United States)
- Materials Technological Laboratories, Motorola Inc., K-10, Austin, Texas 78721 (United States)
Isotopic labeling experiments ({sup 18}O{sub 2}) have been carried out to understand the film-formation reactions in the metalorganic chemical vapor deposition of (Ba,&hthinsp;Sr)TiO{sub 3} (BST) films. Time-of-flight secondary ion mass spectrometry reveals both M&hthinsp;{sup 18}O and M&hthinsp;{sup 16}O (M=Ba, Sr, Ti) in the BST films, indicating that the oxygen in the BST films originates from both the gas phase oxidants ({sup 18}O), and the precursor ligands ({sup 16}O). Use of a 50{percent} {sup 18}O{sub 2}-50{percent} N{sub 2}&hthinsp;{sup 16}O mixture results in a reduction of {sup 18}O incorporation in the BST film, indicating direct involvement of N{sub 2}O in the film-formation reactions. Addition of N{sub 2}O in O{sub 2} also appears to improve film surface morphology and step coverage. {copyright} {ital 1999 American Institute of Physics.}
- OSTI ID:
- 365872
- Journal Information:
- Applied Physics Letters, Vol. 75, Issue 3; Other Information: PBD: Jul 1999
- Country of Publication:
- United States
- Language:
- English
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