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Fermi surface study of pseudomorphic Fe{sub 1{minus}x}Ni{sub x} and Co{sub 1{minus}x}Ni{sub x} thin films on Cu(100)

Journal Article · · Journal of Vacuum Science and Technology, A
DOI:https://doi.org/10.1116/1.581814· OSTI ID:359788
; ;  [1]; ;  [2]; ;  [3];  [4]
  1. Department of Physics, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
  2. University of Missouri, Rolla, Missouri (United States)
  3. Lawrence Livermore National Laboratory, Livermore, California (United States)
  4. Lawrence Berkeley National Laboratory, Berkeley, California (United States)

We report angle resolved photoemission studies of the electronic behavior of ultrathin epitaxial layers of fcc structured binary alloys, Fe{sub 1{minus}x}Ni{sub x} and Co{sub 1{minus}x}Ni{sub x}, deposited by molecular beam epitaxy on Cu(100) substrates. In particular, we have used Fermi surface mapping to monitor changes in the Fermi surface with increasing magnetization density. Fe{sub 1{minus}x}Ni{sub x} and Co{sub 1{minus}x}Ni{sub x} binary alloys show a different behavior in the bulk. Co{sub 1{minus}x}Ni{sub x} is structurally and magnetically well-behaved. In particular, the magnetic moment varies linearly as a function of concentration. This is in sharp contrast to fcc Fe{sub 1{minus}x}Ni{sub x} which displays a magnetic instability at {approximately}65{percent} Fe content. An extended regime of fcc stability is possible via epitaxy on Cu(100). The changes in the Fermi surfaces of Fe{sub 1{minus}x}Ni{sub x} and Co{sub 1{minus}x}Ni{sub x} pseudomorphic film alloys depending on various concentrations of Ni have been investigated in a large photon energy regime. We address the following question: To what degree is the Fermi surface sharply preserved in substitutional alloys? {copyright} {ital 1999 American Vacuum Society.}

OSTI ID:
359788
Report Number(s):
CONF-981126--
Journal Information:
Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 4 Vol. 17; ISSN 0734-2101; ISSN JVTAD6
Country of Publication:
United States
Language:
English

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