Stacked insulator induction accelerator gaps

Conference · Thu May 01 04:00:00 EDT 1997

OSTI ID:358834

Houck, T I; Westenskow, G A; Kim, J S; Eylon, S; Henestroza, E; Yu, S S; Vanecek, D

Stacked insulators, with alternating layers of insulating material and conducting film, have been shown to support high surface electrical field stresses. We have investigated the application of the stacked insulator technology to the design of induction accelerator modules for the Relativistic-Klystron Two-Beam Accelerator program. The rf properties of the accelerating gaps using stacked insulators, particularly the impedance at frequencies above the beam pipe cutoff frequency, are investigated. Low impedance is critical for Relativistic-Klystron Two-Beam Accelerator applications where a high current, bunched beam is trsnsported through many accelerating gaps. An induction accelerator module designs using a stacked insulator is presented.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 358834
• Report Number(s): UCRL-JC--127273; CONF-970503--; ON: DE98050949
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ACCELERATORS
ELECTRICAL INSULATORS
INDUCTION