Modeling of plasma remediation of VOCs in dielectric barrier discharges
Conference
·
OSTI ID:338493
- Univ. of Illinois, Urbana, IL (United States). Dept. of Electrical and Computer Engineering
Since each year significant quantities of toxic wastes containing volatile organic compounds (VOCs) are produced by chemical and allied industries, destruction of these VOCs has become a major environmental concerns. Dielectric barrier discharges (DBDs) are promising low cost plasma sources for destruction of the VOCs. The efficient of plasma remediation depends on gas mixture, the dielectric constant and format of the voltage pulse. The authors have developed 1-d and 2-d plasma chemistry and hydrodynamic models to focus on the energy efficiency and optimum conditions for destruction of chlorinated hydrocarbons including CCI{sub 4} and CHCI{sub 3} which are widely used as industrial solvents. The plasma remediation model consists of circuit models, solution of Boltzmann`s equation for the electron energy distribution, plasma chemistry modules, and solution of the compressible Navier Stokes equations. CCI{sub 4} and CHCI{sub 3} can be initially destroyed by dissociative-electron-attachment which requires different discharge conditions than for generation of radicals for chemical remediation. These different operating regions are discussed. The authors present a detailed description of the major plasma chemical pathways and discuss the effects of varying parameters, such as applied voltage, dielectric constant, gas mixture content in the gas stream, and temperature on the amount and energy efficiency of remediation.
- Sponsoring Organization:
- National Science Foundation, Washington, DC (United States); Office of Naval Research, Washington, DC (United States)
- OSTI ID:
- 338493
- Report Number(s):
- CONF-970559--
- Country of Publication:
- United States
- Language:
- English
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