Plume-induced stress in pulsed-laser deposited CeO{sub 2} films

Journal Article · Thu Apr 01 04:00:00 EST 1999 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.123780· OSTI ID:336597

Norton, D P; Park, C; Budai, J D; Pennycook, S J; Prouteau, C ^[1]

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1. Oak Ridge National Laboratory, Solid State Division, Oak Ridge, Tennessee 37831-6056 (United States)

Residual compressive stress due to plume-induced energetic particle bombardment in CeO{sub 2} films deposited by pulsed-laser deposition is reported. For laser ablation film growth in low pressures, stresses as high as 2 GPa were observed as determined by substrate curvature and four-circle x-ray diffraction. The amount of stress in the films could be manipulated by controlling the kinetic energies of the ablated species in the plume through gas-phase collisions with an inert background gas. The film stress decreased to near zero for argon background pressures greater than 50 mTorr. At these higher background pressures, the formation of nanoparticles in the deposited film was observed. {copyright} {ital 1999 American Institute of Physics.}

• OSTI ID: 336597
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 15 Vol. 74; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABLATION
CERIUM COMPOUNDS
CERIUM OXIDES
ENERGY BEAM DEPOSITION
LASER RADIATION
RADIATION EFFECTS
STRESSES
THIN FILMS
X-RAY DIFFRACTION