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Title: Virtual mask digital electron beam lithography

Patent ·
OSTI ID:335477

Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made. 5 figs.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC05-96OR22464
Assignee:
Lockheed Martin Energy Research Corp., Oak Ridge, TN (United States)
Patent Number(s):
US 5,892,231/A/
Application Number:
PAN: 8-795,003
OSTI ID:
335477
Resource Relation:
Other Information: PBD: 6 Apr 1999
Country of Publication:
United States
Language:
English