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Hydrophobic forces in thin water films stabilized by dodecylammonium chloride

Journal Article · · Journal of Colloid and Interface Science
;  [1]
  1. Virginia Polytechnic Inst. and State Univ., Blacksburg, VA (United States). Center for Coal and Minerals Processing

A thin film balance of Scheludko-Exerowa type was used to determine equilibrium film thicknesses of dodecylammonium chloride (RNH{sub 3}Cl) solutions. The data were analyzed in view of the extended DLVO theory, which considers electrostatic, van der Waals. and hydrophobic forces. The hydrophobic force was represented as a power law which is of the same form as for the van der Waals force, so that its constant K{sub 232} can be directly compared with the Hamaker constant, A{sub 232}. The results showed that at low surfactant concentrations, K{sub 232} is positive and decreases with increasing surfactant concentration, suggesting that hydrophobic force plays an important role in thin films. When the K{sub 232} versus concentration plot was extrapolated to very dilute solutions, K{sub 232} approaches 10{sup {minus}17} J, which is approximately 270 times larger than A{sub 232}. When the surfactant concentration was increased above 2 {times} 10{sup {minus}3} M, however, K{sub 232} becomes negative, indicating that hydration force appears at high surfactant concentrations. These results suggest that air bubbles are hydrophobic and the hydrophobicity decreases with increasing surfactant concentration. A TFB was used to obtain a disjoining pressure isotherm at 10{sup {minus}3} M RNH{sub 3}Cl in the presence of 10{sup {minus}4} M NaCl. The results can be fitted to the extended DLVO theory with K{sub 232} = 6 {times} 10{sup {minus}19} J. Consideration of hydrophobic force predicted a rupture thickness larger than predicted using the DLVO theory, but is substantially smaller than the experimental result. This discrepancy may be ascribed to the hydrodynamic force operating in the film thinning process.

Sponsoring Organization:
USDOE, Washington, DC (United States)
OSTI ID:
328311
Journal Information:
Journal of Colloid and Interface Science, Journal Name: Journal of Colloid and Interface Science Journal Issue: 1 Vol. 211; ISSN 0021-9797; ISSN JCISA5
Country of Publication:
United States
Language:
English

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