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Organosulfur monolayers at gold surfaces: Reexamination of the case for sulfide adsorption and implications to the formation of monolayers from thiols and disulfides

Journal Article · · Langmuir
DOI:https://doi.org/10.1021/la980901+· OSTI ID:316338
; ; ;  [1]
  1. Ames Lab., IA (United States). Microanalytical Instrumentation Center
This paper presents the results from a reexamination of the adsorption of organosulfides on gold films. The original goal was to explore the adsorption of different organosulfur precursors (e.g., sulfides) as a basis for addressing details related to gold-sulfur interactions in thiol-derived monolayers. The results of previous work were, however, complicated by the purity of most organosulfides as well as by the competitive adsorption of thiol and disulfide impurities. By using preparative gas chromatographic purification, the authors were able to reduce significantly the levels of both types of impurities from the organosulfide precursors, as confirmed by mass spectrometric analyses. Spectroscopic (infrared and X-ray photoelectron) and electrochemical characterizations of adlayers formed on gold from these highly purified organosulfides have led the authors to reach new conclusions regarding their earlier work. First, the amount of adsorbed sulfide corresponds to only a small fraction of a monolayer. Second, the chemical identity of sulfur for the adsorbed sulfide remains unchanged. These results not only correct earlier assessment but also illustrate the importance of purifying these precursors to unexpectedly high levels when probing issues related to the formation and structure of this adsorbate-substrate combination. The implications of these results, particularly those developed from the XPS data, to the nature of the interactions of the sulfur from thiols and disulfides with gold are discussed.
Sponsoring Organization:
USDOE, Washington, DC (United States)
OSTI ID:
316338
Journal Information:
Langmuir, Journal Name: Langmuir Journal Issue: 2 Vol. 15; ISSN LANGD5; ISSN 0743-7463
Country of Publication:
United States
Language:
English

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