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Title: Microscopic study of the hydrogen diffusion in III-V semiconductors

Book ·
OSTI ID:308106
; ; ;  [1];  [2];  [3]; ;  [4]
  1. Univ. Konstanz (Germany). Fakultaet fuer Physik
  2. CERN/PPE, Geneva (Switzerland)
  3. Univ. Bayreuth (Germany). Physikalische Chemie
  4. Inst. of Spectroscopy, Troitzk (Russian Federation)

The authors report on experiments which observe on a microscopic scale the migration of isolated hydrogen in InP, GaAs, and InAs. Using the radioactive acceptor {sup 117}Cd, Cd-H pairs have been formed in these III-V semiconductors. After the decay of {sup 117}Cd to {sup 117}In, H is no longer bound to an acceptor and can diffuse freely. This diffusion has been observed by perturbed {gamma}{gamma} angular correlation (PAC) spectroscopy. At 10 K, the occupation of two different lattice sites by hydrogen has been observed. First results on the diffusion of hydrogen will be discussed.

OSTI ID:
308106
Report Number(s):
CONF-980405-; TRN: IM9907%%32
Resource Relation:
Conference: Spring meeting of the Materials Research Society, San Francisco, CA (United States), 13-17 Apr 1998; Other Information: PBD: 1998; Related Information: Is Part Of Hydrogen in semiconductors and metals; Nickel, N.H. [ed.] [Hahn-Meitner-Inst., Berlin (Germany)]; Jackson, W.B. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Bowman, R.C. [ed.] [Jet Propulsion Lab., Pasadena, CA (United States)]; Leisure, R.G. [ed.] [Colorado State Univ., Fort Collins, CO (United States)]; PB: 469 p.; Materials Research Society symposium proceedings, Volume 513
Country of Publication:
United States
Language:
English

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