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Structure and mechanical properties of reactive sputter deposited TiN/TaN multilayered films

Book ·
OSTI ID:305547
;  [1]; ;  [2]; ;  [3]
  1. Univ. of Tokyo (Japan). Inst. of Industrial Science
  2. Shibaura Inst. of Tech., Tokyo (Japan)
  3. Hitachi Tool Engineering, Ltd., Narita, Chiba (Japan)
TiN/TaN multilayers were grown by reactive magnetron sputtering on WC-Co sintered hard alloy and MgO(100) single crystal substrates. Multilayer structure and composition modulation amplitudes were studied using x-ray diffraction method. Hardness and elastic modulus were measured by nanoindentation tester. For bilayer thickness ({Lambda}) larger than 80 {angstrom}, hardness are lower than rule-of-mixtures value of individual single layers, and increased rapidly with decreasing {Lambda}, peaking at hardness values {approx}33% higher than that at {Lambda} = 43 {angstrom}. As a result of analysis the inclination of applied load for indenter displacement on P-h curve ({Delta}P/{Delta}h), this paper exhibits that the enhancement of the resistance to dislocation motion and elastic anomaly due to coherency strains are responsible for the hardness change.
OSTI ID:
305547
Report Number(s):
CONF-971201--
Country of Publication:
United States
Language:
English

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